Ion Implantation Technology 2008: 17th International Conference on Ion Implantation Technology, OOT 2008, Held in Monterey, California, 8-13 June 2008
by Seebauer, Edmund G.; Felch, Susan B.; Jain, Amitabh; Kondratenko, Yevgeniy V.Format: Hardcover
Pub. Date: 2009-03-17
Publisher(s): Amer Inst of Physics
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Summary
The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).
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